There is a newer version of the record available.

Published October 1, 2020 | Version v1
Journal article

A 0.5–3.0 GHz SP4T RF switch with improved body self-biasing technique in 130-nm SOI CMOS

  • 1. Micro-/Nano-Electronic System Integration R&D Center (MESIC), University of Science and Technology of China (USTC), Hefei 230026 (China)
  • 2. Hengxin Semitech Co., Ltd., Suzhou 215123 (China)

Description

A single-pole four-throw (SP4T) RF switch with charge-pump-based controller is designed and implemented in a commercial 130-nm silicon-on-insulator (SOI) CMOS process. An improved body self-biasing technique based on diodes is utilized to simplify the controlling circuitry and improve the linearity. A multistack field-effect-transistor (FET) structure with body floating technique is employed to provide good power-handling capability. The proposed design demonstrates a measured input 0.1-dB compression point of 38.5 dBm at 1.9 GHz, an insertion loss of 0.27 dB/0.33 dB and an isolation of 35 dB/27 dB at 900 MHz/1.9 GHz, respectively. The overall chip area is only 0.49 mm2. This RF switch can be used in GSM/WCDMA/LTE front-end modules. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/41/10/102404

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
41
Journal Issue
10
Journal Page Range
[7 p.]
ISSN
1674-4926

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54020533
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S42: ENGINEERING;
Descriptors DEI
DESIGN; FIELD EFFECT TRANSISTORS; GHZ RANGE; MHZ RANGE; PUMPING; SILICON
Descriptors DEC
ELEMENTS; FREQUENCY RANGE; SEMICONDUCTOR DEVICES; SEMIMETALS; TRANSISTORS