Published July 1, 2006 | Version v1
Journal article

Synchrotron X-ray topography study of defects in epitaxial GaAs on high-quality Ge

  • 1. Optoelectronics Laboratory, Helsinki University of Technology, PO Box 3500, FIN-02015 TKK (Finland)
  • 2. Research Institute for Networks and Communications Engineering (RINCE), Dublin City University, Dublin 9 (Ireland)
  • 3. Oxford Instruments Analytical Oy, PO Box 85, FI-02631 Espoo (Finland)
  • 4. Science Payload and Advanced Concepts Office, ESA/ESTEC, 2200 AG, Noordwijk (Netherlands)

Description

Crystal defects of GaAs thin films deposited by metalorganic vapour phase epitaxy on high-quality Ge substrates are studied by synchrotron X-ray topography. The GaAs thin films were measured to have ∼500 dislocations cm-2, which is a similar number to what plain Ge substrates show. The dislocation densities measured are also smaller than, for instance, those of high-quality vapour pressure controlled Czochralski grown GaAs wafers, which typically have dislocation densities of ∼1500cm-2. The GaAs films grown on both sides of two-sided substrates display very good crystal quality throughout the sample

Additional details

Identifiers

DOI
10.1016/j.nima.2006.01.066;
PII
S0168-9002(06)00149-5;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
563
Journal Issue
1
Journal Page Range
p. 62-65
ISSN
0168-9002
CODEN
NIMAER

Conference

Title
7. international workshop on radiation imaging detectors
Acronym
IWORID 2005
Dates
4-7 Jul 2005
Place
Grenoble (France)

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.