Published July 1, 2018 | Version v1
Journal article

Research on photoresponse characteristics of bilayer molybdenum disulfide field effect transistors

  • 1. School of Science, International Joint Research Center for Nanophotonics and Biophotonics, Changchun University of Science and Technology, 7089 Wei-Xing Road, Changchun 130022 (China)

Description

The field-effect transistors (FETs) have attracted much attention because of the unique properties of the layered MoS2 nanosheet as an ideal channel material. The phototransistors based on the MoS2 FET have advantages of high photoresponsivity, rapid and stable response. This paper is concerned with the fabrication of bilayer MoS2 based FET and the research on the photoelectric characteristics of the devices. The effect of the optical power and gate voltage on the photoelectric properties of the device was researched through the contrast experiments. It has been achieved that the photocurrent increases with the increase of optical power at the same gate voltage and drain voltage. The photoresponsivity also been enhanced with the gate voltage increased. And the photoresponsivity of bilayer MoS2 FET was enhanced more than 100 folds by using MoS2/MoO3 as the channel material. The results indicated that the MoS2/MoO3 nanosheets can be a promising heterostructure material to offer a compelling case for application in enhancing the photoresponse characteristics of MoS2 transistors. These unique properties make the bilayer MoS2 based FET to be a great potential candidate of the next generation optoelectronic devices, which have the trend of miniaturization and integration. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1757-899X/382/2/022070

Additional details

Publishing Information

Journal Title
IOP Conference Series. Materials Science and Engineering (Online)
Journal Volume
382
Journal Issue
2
Journal Page Range
[5 p.]
ISSN
1757-899X

Conference

Title
International Conference on Advanced Materials, Intelligent Manufacturing and Automation
Dates
23-26 May 2018
Place
Nanjing (China)