Published May 26, 2003 | Version v1
Journal article

Comparison of radiative and structural properties of 1.3 μm InxGa(1-x)As quantum-dot laser structures grown by metalorganic chemical vapor deposition and molecular-beam epitaxy: Effect on the lasing properties

  • 1. Institute of Quantum Electronics and Photonics, Ecole Polytecnic Federale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland)
  • 2. Consiglio Nazionale delle Ricerche, Istituto IMM-CNR, via Arnesano, 73100 Lecce (Italy)
  • 3. National Nanotechnology Laboratory, INFM-Unita di Lecce c/o Dipartimento di Ingegneria dell'Innovazione, Universita di Lecce, Via Arnesano, 73100 Lecce (Italy)

Description

We have studied the radiative and structural properties of identical InxGa(1-x)As quantum dot laser structures grown by metalorganic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). Despite the comparable emission properties found in the two devices by photoluminescence, electroluminescence, and photocurrent spectroscopy, efficient lasing from the ground state is achieved only in the MBE sample, whereas excited state lasing is obtained in the MOCVD device. Such a difference is ascribed to the existence of the internal dipole field in the MOCVD structure, induced by the strong faceting of the dots, as observed by high-resolution transmission electron microscopy

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
82
Journal Issue
21
Journal Page Range
p. 3632-3634
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2003 American Institute of Physics.