Finite element analysis on factors influencing the clamping force in an electrostatic chuck
- 1. School of Engineering and Technology, China University of Geosciences (Beijing), Beijing 100083 (China)
- 2. Department of Mechanical Engineering, Tsinghua University, Beijing 100084 (China)
Description
As one of the core components of IC manufacturing equipment, the electrostatic chuck (ESC) has been widely applied in semiconductor processing such as etching, PVD and CVD. The clamping force of the ESC is one of the most important technical indicators. A multi-physics simulation software COMSOL is used to analyze the factors influencing the clamping force. The curves between the clamping force and the main parameters such as DC voltage, electrode thickness, electrode radius, dielectric thickness and helium gap are obtained. Moreover, the effects of these factors on the clamping force are investigated by means of orthogonal experiments. The results show that the factors can be ranked in order of voltage, electrode radius, helium gap and dielectric thickness according to their importance, which may offer certain reference for the design of ESCs. (semiconductor devices)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/35/9/094011Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 35
- Journal Issue
- 9
- Journal Page Range
- [5 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47047648
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- C CODES; CHEMICAL VAPOR DEPOSITION; COMPUTERIZED SIMULATION; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; ELECTRODES; ETCHING; FINITE ELEMENT METHOD; HELIUM; INDICATORS; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; THICKNESS
- Descriptors DEC
- CALCULATION METHODS; CHEMICAL COATING; COMPUTER CODES; DEPOSITION; DIMENSIONS; ELEMENTS; FLUIDS; GASES; MATERIALS; MATHEMATICAL SOLUTIONS; NONMETALS; NUMERICAL SOLUTION; RARE GASES; SIMULATION; SURFACE COATING; SURFACE FINISHING