Effect of argon on the properties of plasma polymerized thin films deposited from benzene using (PECVD) method

Plasma polymerized organic thin films were deposited at room temperature by Plasma Enhanced Chemical Vapor Deposition (PECVD) method using benzene (C6H6) as a precursor material. Radio frequency (r.f.) with 13.56 MHz was applied at a constant r.f. power of 100 Watt. Films were deposited under different benzene/argon ratios of 100:0, 20:80, 15:85, and 10:90. Chemical structures of the deposited film were analyzed using Infrared Reflectance Absorbance Spectroscopy (IRRAS), Fourier Transformation Infra Red (FTIR) system. Contact angle (θ) measurements were carried out to study the changes in the surface free energy of the materials due to plasma treatments. Surface roughness of deposited films was investigated using scanning electron microscopy (SEM). The corrosion protective abilities of films on aluminum magnesium alloy type 6061 as substrate were examined by potentiodynamic curves measurements in 3.5 wt. % NaCl solutions. The effect of benzene/argon ratios on the properties of deposited film were mainly studied in this work. (author)