Published February 23, 2004
| Version v1
Journal article
Photoluminescence and Raman scattering in three-dimensional Si/Si1-xGex nanostructures
- 1. Institute for Microstructural Sciences, National Research Council, Ottawa, K1A 0R6 (Canada)
- 2. Department of Electrical and Computer Engineering, New Jersey Institute of Technology, University Heights, Newark, New Jersey 07102 (United States)
Description
We report detailed Raman and photoluminescence (PL) measurements in Si/Si1-xGex nanostructures grown by molecular-beam epitaxy under conditions of near Stranski-Krastanov (S-K) growth mode. In a series of samples with x controllably increased from 0.098 to 0.53, we observe that an increase in Raman signal related to Ge-Ge vibrations clearly correlates with (i) a redshift in the PL peak position, (ii) an increase in the activation energy of PL thermal quenching, and (iii) an increase in the PL quantum efficiency. The results indicate that in S-K Si/Si1-xGex nanostructures with x>0.5 Ge atoms form nanometer-sized clusters with a nearly pure Ge core and a SiGe shell
Additional details
Identifiers
- DOI
- 10.1063/1.1650873;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 84
- Journal Issue
- 8
- Journal Page Range
- p. 1293-1295
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36028089
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ACTIVATION ENERGY; BINARY ALLOY SYSTEMS; CRYSTAL GROWTH; GERMANIUM ALLOYS; MOLECULAR BEAM EPITAXY; PHOTOLUMINESCENCE; QUANTUM EFFICIENCY; QUANTUM WELLS; QUENCHING; RAMAN EFFECT; RAMAN SPECTRA; SEMICONDUCTOR MATERIALS; SILICON; SILICON ALLOYS
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; CRYSTAL GROWTH METHODS; EFFICIENCY; ELEMENTS; EMISSION; ENERGY; EPITAXY; LUMINESCENCE; MATERIALS; NANOSTRUCTURES; PHOTON EMISSION; SEMIMETALS; SPECTRA
Optional Information
- Notes
- (c) 2004 American Institute of Physics.