Published February 23, 2004 | Version v1
Journal article

Photoluminescence and Raman scattering in three-dimensional Si/Si1-xGex nanostructures

  • 1. Institute for Microstructural Sciences, National Research Council, Ottawa, K1A 0R6 (Canada)
  • 2. Department of Electrical and Computer Engineering, New Jersey Institute of Technology, University Heights, Newark, New Jersey 07102 (United States)

Description

We report detailed Raman and photoluminescence (PL) measurements in Si/Si1-xGex nanostructures grown by molecular-beam epitaxy under conditions of near Stranski-Krastanov (S-K) growth mode. In a series of samples with x controllably increased from 0.098 to 0.53, we observe that an increase in Raman signal related to Ge-Ge vibrations clearly correlates with (i) a redshift in the PL peak position, (ii) an increase in the activation energy of PL thermal quenching, and (iii) an increase in the PL quantum efficiency. The results indicate that in S-K Si/Si1-xGex nanostructures with x>0.5 Ge atoms form nanometer-sized clusters with a nearly pure Ge core and a SiGe shell

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
84
Journal Issue
8
Journal Page Range
p. 1293-1295
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2004 American Institute of Physics.