Boron and phosphorus ion emissions from a Cu-P-Pt-B liquid metal ion source

A liquid metal ion source using a Cu-P-Pt-B alloy has been developed to emit both boron and phosphorus ions for maskless ion implantation. The relative flux intensities of B+ and P2+ to total ion flux are 13 and 15 %, respectively, at total ion current, IT, of 30 μA. These ions are separable by mass separator with a low mass-resolving power of m/Δm ≅ 10. A source lifetime of more than 30 hours has been achieved at IT = 10 ∼ 50 μA. (author)