Published June 20, 2005 | Version v1
Journal article

Capacitance pressure sensor based on GaN high-electron-mobility transistor-on-Si membrane

  • 1. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)
  • 2. Multiplex, Inc., South Plainfield, New Jersey 07080 (United States)
  • 3. Nitronex Corporation, Raleigh, North Carolina 27606 (United States)
  • 4. Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)

Description

The changes in the capacitance of the channel of an AlGaN/GaN high-electron-mobility transistor (HEMT) membrane structure fabricated on a Si substrate were measured during the application of both tensile and compressive strain through changes in the ambient pressure. The capacitance of the channel displays a change of 7.19±0.45x10-3 pF/μm as a function of the radius of the membrane at a fixed pressure of +9.5 bar and exhibits a linear characteristic response between -0.5 and +1 bar with a sensitivity of 0.86 pF/bar for a 600 μm radius membrane. The hysteresis was 0.4% in the linear range. These AlGaN/GaN HEMT membrane-based sensors appear to be promising for both room-temperature and elevated-temperature pressure-sensing applications

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
86
Journal Issue
25
Journal Page Range
p. 253502-253502.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2005 American Institute of Physics