Published 1996
| Version v1
Journal article
Langmuir probe investigation of a plasma produced in a dc magnetron sputtering system
Creators
- 1. Institute of Optoelectronics, PO Box MG-22, R-76900 Bucharest (Romania)
Description
Some characteristics of a plasma produced in reactive dc magnetron system with three rectangular magnetrons for Ti N thin film deposition, were investigated using a cylindrical Langmuir probe. The measurements were made in the substrate zone. The system was operated with titanium target, at a pressure of about 5 ·10-1 Pa, in pure Ar and Ar+N2 mixture, with magnetron currents of 1 A and 3 A. The system was operated with all three magnetrons. From probe characteristics the plasma potential and electron temperature in all these situations were derived. (authors)
Additional details
Publishing Information
- Journal Title
- Romanian Reports in Physics
- Journal Volume
- 49
- Journal Issue
- 3-4
- Journal Page Range
- p. 251-255
- ISSN
- 1221-1451
INIS
- Country of Publication
- Romania
- Country of Input or Organization
- Romania
- INIS RN
- 30002676
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ARGON; DEPOSITION; ELECTRON TEMPERATURE; HIGH VACUUM; LANGMUIR PROBE; MAGNETRONS; MIXTURES; NITROGEN; PLASMA; SPUTTERING; SUBSTRATES; THIN FILMS; TITANATES
- Descriptors DEC
- DISPERSIONS; ELECTRIC PROBES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; OXYGEN COMPOUNDS; PROBES; RARE GASES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- 10 refs., 4 figs.