Published November 1, 2004 | Version v1
Journal article

Determination of gas temperature and thermometric species in inductively coupled plasmas by emission and diode laser absorption

  • 1. NASA Ames Research Center, Moffett Field, CA 94035 (United States)

Description

A vertical cavity surface-emitting laser diode (VCSEL) was used as a spectrally tunable emission source for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3%, 45%, and 90% N2 in Ar) at pressures of 0.5-70 Pa and inductive powers of 100 and 300 W. The results were compared to the rotational temperature derived from the N2 emission at the (0,0) vibrational transition of the C 3Πu-B 3Π g system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar* and N2*) that varied depending on the conditions. A two-dimensional, three-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable us to track the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma

Availability note (English)

Available online at http://stacks.iop.org/0963-0252/13/691/psst4_4_019.pdf or at the Web site for the journal Plasma Sources Science and Technology (ISSN 1361-6595) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
13
Journal Issue
4
Journal Page Range
p. 691-700
ISSN
0963-0252

INIS