Microstructure and electrical property of laser-sintered Cu complex ink
- 1. Department of Materials Science and Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of)
- 2. R and D Center, Chang Sung Co. Ltd., Incheon 405-100 (Korea, Republic of)
Description
We show that highly conductive Cu films are obtainable from Cu complex ink by laser sintering. The Cu inks, synthesized using Cu formate as a precursor, were spin-coated onto polyimide substrate and scanned by an ultraviolet laser at 355 nm. The blowing of N2 gas into the irradiated area prevented the film from being oxidized and a minimum resistivity of 1.70 × 10−5 Ω cm was obtained. The laser-sintered film, composed mainly of nanorods, exhibited a much tighter structure than the one achieved by the typical thermal process. Although the thermal-sintered Cu film had a better crystalline quality, the minimum resistivity values available with both methods were almost identical. This is attributed to the more compact microstructure induced by laser sintering.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2014.03.127Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2014.03.127;
- PII
- S0169-4332(14)00669-2;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 307
- Journal Page Range
- p. 42-45
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46028988
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- COPPER COMPLEXES; ELECTRICAL PROPERTIES; FILMS; INKS; IRRADIATION; LASER RADIATION; MICROSTRUCTURE; NANOSTRUCTURES; SINTERING; SPIN; SUBSTRATES; ULTRAVIOLET RADIATION
- Descriptors DEC
- ANGULAR MOMENTUM; COMPLEXES; ELECTROMAGNETIC RADIATION; FABRICATION; PARTICLE PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; TRANSITION ELEMENT COMPLEXES
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.