Influence of chloride concentration on the formation of AOX in UV oxidative system
- 1. Dokuz Eyluel University, Engineering Faculty, Environmental Engineering Department, 35160 Izmir (Turkey)
- 2. University of Stuttgart, Institute for Sanitary Engineering, Water Quality and Waste Management, 70569 Stuttgart (Germany)
Description
In this study, the effects of chloride ion concentration and pH on UV oxidation treatment were examined. Acetone and sodium dodecyl sulfate (ABS) were used as organic substances. The treatment efficiencies of these chemicals by UV/H2O2 oxidation using a laboratory scale UV-free surface reactor (UV-FSR) with or without Cl- addition at different pH values was compared. Results of this study indicated that Cl- concentration and the chemical structure of the substances are more decisive than pH in the oxidation process. There was no AOX at the start of the experiments but as a result of oxidation a de novo synthesis of AOX was observed, and these AOXdenovo compounds were destroyed during the treatment. Treatment was followed by TOC and AOX measurements. Approximately 98% and 95% TOC removal efficiencies were obtained for the treatment of acetone and ABS containing wastewaters, respectively
Additional details
Identifiers
- DOI
- 10.1016/j.jhazmat.2006.09.010;
- PII
- S0304-3894(06)01051-X;
Publishing Information
- Journal Title
- Journal of Hazardous Materials
- Journal Volume
- 143
- Journal Issue
- 1-2
- Journal Page Range
- p. 171-176
- ISSN
- 0304-3894
- CODEN
- JHMAD9
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018169
- Subject category
- S54: ENVIRONMENTAL SCIENCES;
- Descriptors DEI
- ACETONE; CHLORIDES; CHLORINE IONS; HYDROGEN PEROXIDE; OXIDATION; PH VALUE; REMOVAL; SODIUM; SULFATES; WASTE WATER
- Descriptors DEC
- ALKALI METALS; CHARGED PARTICLES; CHEMICAL REACTIONS; CHLORINE COMPOUNDS; ELEMENTS; HALIDES; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; IONS; KETONES; LIQUID WASTES; METALS; ORGANIC COMPOUNDS; OXYGEN COMPOUNDS; PEROXIDES; SULFUR COMPOUNDS; WASTES; WATER
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.