Published May 2012 | Version v1
Journal article

Formation and annealing of radiation defects in tin-doped p-type germanium crystals

  • 1. Belarussian State University (Belarus)
  • 2. National Academy of Sciences of Belarus, Scientific and Practical Materials Research Center (Belarus)

Description

The effect of tin on the formation and annealing of radiation defects in p-type germanium crystals irradiated with 6-MeV electrons at a temperature of 80 K is studied. It is shown that acceptor complexes SnV with a hole ionization enthalpy of 0.16 eV are dominant in irradiated Ge:(Sn, Ga) crystals after their heating to a temperature of 300 K. These complexes disappeared as a result of the annealing of irradiated crystals in the temperature range 30–75°C. Annealing of irradiated crystals at temperatures in the range 110–150°C brings about the formation of deep-level centers with a donor level at Ev + 0.29 eV; this center is presumably related to a complex consisting of a tin atom and an interstitial gallium atom.

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
46
Journal Issue
5
Journal Page Range
p. 611-614
ISSN
1063-7826
CODEN
SMICES

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43129366
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ANNEALING; ATOMS; COMPLEXES; CRYSTALS; DEFECTS; DOPED MATERIALS; ENTHALPY; GALLIUM; GERMANIUM; TIN
Descriptors DEC
ELEMENTS; HEAT TREATMENTS; MATERIALS; METALS; PHYSICAL PROPERTIES; THERMODYNAMIC PROPERTIES

Optional Information

Copyright
Copyright (c) 2012 Pleiades Publishing, Ltd.