Published July 2000 | Version v1
Journal article

Instrumental neutron activation analysis for certification of ion-implanted arsenic in silicon

  • 1. National Institute of Standards and Technology, Gaithersburg, MD (United States). Chemical Science and Technology Lab.

Description

Standard reference material (SRM) 2134 Arsenic Implant in Silicon was produced at the National Institute of Standards and Technology (NIST) as a calibrant for secondary ion mass spectrometry. Instrumental neutron activation analysis was used as a primary method for certification of the arsenic implanted dose. A complete evaluation of all sources of uncertainty yielded an expanded relative uncertainty for the mean value of this SRM to be 0.38% at approximately the 95% level of confidence. No evidence indicating significant heterogeneity among samples was observed. (author)

Additional details

Publishing Information

Journal Title
Journal of Radioanalytical and Nuclear Chemistry
Journal Volume
245
Journal Issue
1
Journal Page Range
p. 57-63
ISSN
0236-5731
CODEN
JRNCDM

Conference

Title
10. International conference on Modern trends in activation analysis
Dates
19-23 Apr 1999
Place
Bethesda, MD (United States)

INIS

Country of Publication
Hungary
Country of Input or Organization
Hungary
INIS RN
31040517
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARSENIC; CALIBRATION STANDARDS; CERTIFICATION; ION IMPLANTATION; MASS SPECTROSCOPY; NEUTRON ACTIVATION ANALYSIS; RADIATION SOURCE IMPLANTS; SILICON
Descriptors DEC
ACTIVATION ANALYSIS; CHEMICAL ANALYSIS; ELEMENTS; IMPLANTS; RADIATION SOURCES; SEMIMETALS; SPECTROSCOPY; STANDARDS

Optional Information

Notes
12 refs.