Published February 1, 2000
| Version v1
Report
High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography
Description
no abstract available
Availability note (English)
Available from www.als.lbl.govAdditional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--12854
Conference
- Title
- SPIE Conference
- Dates
- 27 Feb - 2 Mar 2000
- Place
- Santa Clara, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33064536
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- ETCHING; FAR ULTRAVIOLET RADIATION; MASKING; REFLECTIVE COATINGS; REFLECTIVITY
- Descriptors DEC
- COATINGS; ELECTROMAGNETIC RADIATION; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; SURFACE FINISHING; SURFACE PROPERTIES; ULTRAVIOLET RADIATION
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)