Crystalline to amorphous phase transformation of Ta2O5 quantum dots driven by residual stress
- 1. Department of Physics, S. G. T. B. Khalsa College, University of Delhi, Delhi, 110007 (India)
- 2. Thin Film Laboratory, Department of Physics and Astrophysics, University of Delhi, Delhi, 110007 (India)
- 3. Department of Physics & Electronics, Hans Raj College, University of Delhi, Delhi, 110007 (India)
Description
Simple vacuum thermal evaporation technique was used to grow Ta2O5 quantum dots. The small dots with large voids between them in ultra-thin films were found to gradually grow in size with decreasing voids with increase in film thickness. The development of residual stress was observed with increasing dot size or film thickness. Residual stress effect on band gap of orthorhombic Ta2O5 quantum dots is studied. Both SAED and XRD confirm that the films thicker than 45 nm become amorphous. Significantly varying optical band gap with film thickness was observed by studying optical absorption of the films. The variation of residual stress with film thickness scales linearly very well with the varying band gap with film thickness. Stress free band gap (3.94 eV) and pressure coefficient of band gap (∂Eg/∂P)T = −26.4 meV/GPa) were determined from this study. Transformation from crystalline to amorphous phase in orthorhombic form of Ta2O5 has been determined to be at about 18 GPa. Both crystalline to amorphous transition and pressure coefficient of band gap for orthorhombic Ta2O5 driven by residual stress have been determined for the first time in the literature. - Graphical abstract: Ta2O5 quantum dots were grown using simple vacuum thermal evaporation technique. The development of residual stress progresses with increasing dot size or film thickness. Residual stress effect on band gap of orthorhombic Ta2O5 quantum dots is studied. Both SAED and XRD confirm that the films thicker than 45 nm become amorphous. The variation of residual stress with film thickness scales linearly very well with the varying band gap with film thickness. Stress free band gap (3.94 eV) and pressure coefficient of band gap (∂Eg/∂P)T = −26.4 meV/GPa) were determined from this study. Transformation from crystalline to amorphous phase in orthorhombic form of Ta2O5 has been determined to be at about 18 GPa. Both crystalline to amorphous transition and pressure coefficient of band gap for orthorhombic Ta2O5 driven by residual stress have been determined for the first time in the literature. - Highlights: • Residual stress induced crystalline to amorphous phase transformation in Ta2O5 QDs. • Pressure coefficient of band gap for orthorhombic Ta2O5 have been determined. • Crystalline to amorphous transition have been determined.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2015.09.220Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2015.09.220;
- PII
- S0925-8388(15)31197-X;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 657
- Journal Page Range
- p. 366-371
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49099736
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; FILMS; MEV RANGE; ORTHORHOMBIC LATTICES; OXIDATION; PRESSURE COEFFICIENT; PRESSURE RANGE GIGA PA; QUANTUM DOTS; RESIDUAL STRESSES; TANTALUM OXIDES; THICKNESS; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIFFRACTION; DIMENSIONS; ENERGY RANGE; NANOSTRUCTURES; OXIDES; OXYGEN COMPOUNDS; PRESSURE RANGE; REACTIVITY COEFFICIENTS; REFRACTORY METAL COMPOUNDS; SCATTERING; STRESSES; TANTALUM COMPOUNDS; THREE-DIMENSIONAL LATTICES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.