Published October 1, 2009
| Version v1
Journal article
Electroless plating of aluminum using diisobutyl aluminum hydride as liquid reducing agent in room-temperature ionic liquid
- 1. Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641, Yamazaki, Noda-shi, Chiba 278-8510 (Japan)
Description
We investigated an electroless aluminum plating based on using AlCl3-1-ethyl-3-methylimidazolium chloride (AlCl3-EMIC) ionic liquid with diisobutyl aluminum hydride (DIBAH) as a liquid reducing agent. The plating film was analyzed by measurements of X-ray diffraction, scanning electron microscopy with energy-dispersive X-ray analysis (SEM-EDX) and glow discharge optical emission spectroscopy (GD-OES). Consequently, a thick aluminum plating film with high uniformity was prepared from AlCl3-EMIC with DIBAH. No impurity phases were detected. Moreover, we discussed the reaction mechanism of the electroless aluminum plating.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2009.05.052Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2009.05.052;
- PII
- S0013-4686(09)00737-3;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 54
- Journal Issue
- 24
- Journal Page Range
- p. 5889-5893
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41044247
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ALUMINIUM CHLORIDES; ALUMINIUM HYDRIDES; EMISSION SPECTROSCOPY; FILMS; GLOW DISCHARGES; LIQUIDS; PLATING; REACTION KINETICS; REDUCING AGENTS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE RANGE 0273-0400 K; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHLORIDES; CHLORINE COMPOUNDS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTRIC DISCHARGES; ELECTRON MICROSCOPY; FLUIDS; HALIDES; HALOGEN COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; MICROSCOPY; SCATTERING; SPECTROSCOPY; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.