Published March 17, 1992 | Version v1
Patent

H2S abatement with stabilized chelates in geothermal drilling

Creators

Description

This patent describes a method for removing hydrogen sulfide from a gas stream. It comprises contacting a gas containing hydrogen sulfide with an aqueous chelating solution to form elemental sulfur, the solution comprising: ferric ions in a concentration of at least about 100 ppm; an aminocarboxylic acid chelating agent in an amount of at least an equivalent weight relative to the ferric ions; a buffering compound for maintaining a pH between about 4 and about 11; and a water-soluble inhibitor having a hydroxyl reaction rate constant of at least about 1 x 109 dm3mol-1s-1 effective as a hydroxyl radical scavenger in an amount substantially in excess of an equivalent weight relative to the ferric ions, the inhibitor selected from the group consisting of iodide and bromide ions, nitrites, amino acids, aliphatic aldehydes, aryl sulfonic acids, and combinations thereof; wherein at least a portion of the ferric ions are reduced to ferrous ions; removing the sulfur from the solution; and oxidizing the ferric ions to regenerate the solution for reuse

Availability note (English)

Patent and Trademark Office, Box 9, Washington, DC 20232 (United States).

Additional details

Publishing Information

Imprint Pagination
vp.
IPC:
Int. Cl. C01B 17/05.
IPC
Int. Cl. C01B 17/05.
Patent number
US patent document 5,096,691/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
23075238
Subject category
S15: GEOTHERMAL ENERGY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
AIR POLLUTION ABATEMENT; CHELATING AGENTS; CHEMICAL REACTION KINETICS; GASEOUS WASTES; GEOTHERMAL WELLS; HYDROGEN SULFIDES; PH VALUE; WASTE MANAGEMENT; WELL DRILLING
Descriptors DEC
CHALCOGENIDES; DRILLING; HYDROGEN COMPOUNDS; KINETICS; MANAGEMENT; POLLUTION ABATEMENT; REACTION KINETICS; SULFIDES; SULFUR COMPOUNDS; WASTES; WELLS

Optional Information

Secondary number(s)
US patent application 7-295,311.