Automated CBED processing: Sample thickness estimation based on analysis of zone-axis CBED pattern
Description
An automated processing of convergent beam electron diffraction (CBED) patterns is presented. The proposed methods are used in an automated tool for estimating the thickness of transmission electron microscopy (TEM) samples by matching an experimental zone-axis CBED pattern with a series of patterns simulated for known thicknesses. The proposed tool detects CBED disks, localizes a pattern in detected disks and unifies the coordinate system of the experimental pattern with the simulated one. The experimental pattern is then compared disk-by-disk with a series of simulated patterns each corresponding to different known thicknesses. The thickness of the most similar simulated pattern is then taken as the thickness estimate. The tool was tested on [0 1 1] Si, [0 1 0] α-Ti and [0 1 1] α-Ti samples prepared using different techniques. Results of the presented approach were compared with thickness estimates based on analysis of CBED patterns in two beam conditions. The mean difference between these two methods was 4.1% for the FIB-prepared silicon samples, 5.2% for the electro-chemically polished titanium and 7.9% for Ar+ ion-polished titanium. The proposed techniques can also be employed in other established CBED analyses. Apart from the thickness estimation, it can potentially be used to quantify lattice deformation, structure factors, symmetry, defects or extinction distance. - Highlights: • Automated TEM sample thickness estimation using zone-axis CBED is presented. • Computer vision and artificial intelligence are employed in CBED processing. • This approach reduces operator effort, analysis time and increases repeatability. • Individual parts can be employed in other analyses of CBED/diffraction pattern
Availability note (English)
Available from http://dx.doi.org/10.1016/j.ultramic.2014.12.006Additional details
Identifiers
- DOI
- 10.1016/j.ultramic.2014.12.006;
- PII
- S0304-3991(14)00257-5;
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 150
- Journal Page Range
- p. 88-95
- ISSN
- 0304-3991
- CODEN
- ULTRD6
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47038159
- Subject category
- S36: MATERIALS SCIENCE; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ARGON IONS; ARTIFICIAL INTELLIGENCE; CRYSTAL STRUCTURE; DATA PROCESSING; DEFECTS; DEFORMATION; ELECTRON BEAMS; ELECTRON DIFFRACTION; SILICON; STRUCTURE FACTORS; SYMMETRY; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; DIMENSIONLESS NUMBERS; ELECTRON MICROSCOPY; ELEMENTS; IONS; LEPTON BEAMS; METALS; MICROSCOPY; PARTICLE BEAMS; PROCESSING; SCATTERING; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.