A high brightness plasma sputter heavy negative ion source

A high-intensity, pulsed-mode, plasma-sputter heavy negative ion source has been developed; this source holds promise for a number of uses, including tandem electrostatic accelerator/synchrotron injection applications. To date, the source has been used to generate mA intensities from more than 18 sputter probes. A brief description of the source and typical performance data for a number of ion species are given. In addition, basic ion source operational data, such as intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure, along with emittance data, are presented. (orig.)