Published September 22, 2011 | Version v1
Journal article

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

  • 1. Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield, NSW 2070 (Australia)
  • 2. College of Chemistry and Chemical Engineering, Chongqing University of Technology, 69 Hongguang Rd, Lijiatuo, Banan District, Chongqing 400054 (China)
  • 3. Plasma Nanoscience, School of Physics, University of Sydney, Sydney, NSW 2006 (Australia)
  • 4. College of Materials Science and Engineering, Chongqing University, Chongqing 400044 (China)

Description

Highlights: → A new and custom-designed bias-enhanced hot-filament chemical vapor deposition system is developed to synthesize vertically aligned carbon nanotubes. → The carbon nanotubes are later treated with nitrogen plasmas. → The electron field emission characteristics of the carbon nanotubes are significantly improved after the nitrogen plasma treatment. → A new physical mechanism is proposed to interpret the improvement of the field emission characteristics. - Abstract: The electron field emission (EFE) characteristics from vertically aligned carbon nanotubes (VACNTs) without and with treatment by the nitrogen plasma are investigated. The VACNTs with the plasma treatment showed a significant improvement in the EFE property compared to the untreated VACNTs. The morphological, structural, and compositional properties of the VACNTs are extensively examined by scanning electron microscopy, transmission electron microscopy, Raman spectroscopy, and energy dispersive X-ray spectroscopy. It is shown that the significant EFE improvement of the VACNTs after the nitrogen plasma treatment is closely related to the variation of the morphological and structural properties of the VACNTs. The high current density (299.6 μA/cm2) achieved at a low applied field (3.50 V/μm) suggests that the VACNTs after nitrogen plasma treatment can serve as effective electron field emission sources for numerous applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2011.07.026

Additional details

Identifiers

DOI
10.1016/j.jallcom.2011.07.026;
PII
S0925-8388(11)01494-0;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
509
Journal Issue
38
Journal Page Range
p. 9329-9334
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.