Published May 2017 | Version v1
Journal article

Assessing and ameliorating the influence of the electron beam on carbon nanotube oxidation in environmental transmission electron microscopy

  • 1. Stanford Nano Shared Facilities, Stanford University, Stanford, CA 94305 (United States)
  • 2. Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305 (United States)

Description

In this work, we examine how the imaging electron beam can induce damage in carbon nanotubes (CNTs) at varying oxygen gas pressures and electron dose rates using environmental transmission electron microscopy (ETEM). Our studies show that there is a threshold cumulative electron dose which brings about damage in CNTs in oxygen – through removal of their graphitic walls – which is dependent on O2 pressure, with a 4–5 fold decrease in total electron dose per decade increase at a lower pressure range (10−6 to 10−5 mbar) and approximately 1.3 –fold decrease per decade increase at a higher pressure range (10−3 to 100 mbar). However, at a given pressure, damage in CNTs was found to occur even at the lowest dose rate utilized, suggesting the absence of a lower limit for the latter parameter. This study provides guidelines on the cumulative dose required to damage nanotubes in the 10−7 mbar to 100 mbar pressure regimes, and discusses the role of electron dose rate and total electron dose on beam-induced CNT degradation experiments. - Highlights: • The electron beam ionizes gas molecules in ETEM and affects experimental outcomes. • Beam-induced damage in CNTs occurs at varying O2 pressures and electron dose rates. • There is a threshold cumulative dose to damage CNTs which depends on O2 pressure. • At a given pressure, CNT damage occurs even at the electron dose rate utilized.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2016.12.009

Additional details

Identifiers

DOI
10.1016/j.ultramic.2016.12.009;
PII
S0304-3991(16)30380-1;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
176
Journal Page Range
p. 132-138
ISSN
0304-3991
CODEN
ULTRD6

Conference

Title
4. conference on frontiers of aberration corrected electron microscopy
Acronym
PICO 2017
Dates
30 Apr - 4 May 2017
Place
Kasteel Vaalsbroek (Netherlands)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48086022
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CARBON NANOTUBES; DAMAGE; DOSE RATES; DOSES; ELECTRON BEAMS; GRAPHITE; OXIDATION; OXYGEN; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
BEAMS; CARBON; CHEMICAL REACTIONS; ELECTRON MICROSCOPY; ELEMENTS; LEPTON BEAMS; MICROSCOPY; MINERALS; NANOSTRUCTURES; NANOTUBES; NONMETALS; PARTICLE BEAMS

Optional Information

Copyright
Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.