Published March 3, 2008 | Version v1
Journal article Metadata-only

Improving spatial resolution and reducing aspect ratio in multiphoton polymerization nanofabrication

Creators

  • 1. Graduate School of Chinese Academy of Sciences, Beijing 100080 (China)
  • 2. Laboratory of Organic NanoPhotonics and Laboratory of Organic Optoelectronic Functional Materials and Molecular Engineering, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100080 (China)

Description

The authors investigate the phenomena affecting lateral spatial resolution (LSR) and aspect ratio (AR) in multiphoton polymerization (MPP) nanofabrication. A LSR of 50 nm and an AR of 1.38 were achieved for photocured polymer lines on the surface of a substrate by continuing scanning mode. Theoretical analysis based on the distribution of light intensity in this setup indicates that the LSR could be improved to better than 20 nm. The asymmetric shrinkage of voxel in the axial and lateral directions has a significant impact for obtaining features of low AR, which are a critical requirement for construction of micro/nanodevices by MPP nanofabrication

Additional details

Identifiers

DOI
10.1063/1.2841042;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
92
Journal Issue
9
Journal Page Range
p. 091113-091113.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40003111
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ASPECT RATIO; ASYMMETRY; CONSTRUCTION; CURING; FABRICATION; MULTI-PHOTON PROCESSES; NANOSTRUCTURES; PHOTOCHEMISTRY; POLYMERIZATION; POLYMERS; SHRINKAGE; SPATIAL RESOLUTION; SUBSTRATES
Descriptors DEC
CHEMICAL REACTIONS; CHEMISTRY; DIMENSIONLESS NUMBERS; RESOLUTION

Optional Information

Notes
(c) 2008 American Institute of Physics