Intense, pulsed, ion-diode sources and their application to mirror machines
Description
Startup conditions for future mirror fusion experiments require a rapidly formed target plasma of approximately 0.5 coulomb of ions with energy of 50 to 100 keV. Theory suggests that very intense ion-flux emission satisfying these requirements can be extracted from a pulsed ion diode. Developing such sources would be an ideal CTR application of the high-power, single-shot capability of pulsed power technology. Recent experimental results are reviewed in which approximately 2 kA/cm2 of D+ at approximately 50 keV was extracted. In the experiment, an intense relativistic electron beam undergoes many transits through a solid but range-thin anode foil. With each transit the electrons lose energy, causing their trajectories to collapse toward the anode surface. In so doing, the increased space charge extracts an intense ion flux from the anode foil's plasma. Observations are reported on the importance of diode stability. The general agreement between theoretical scaling laws and experimental results are also presented
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS.Files
7266760.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 23 p.
- Report number
- UCRL--77156
Conference
- Title
- 1. international topical conference on electron beam research and technology.
- Dates
- 3 Nov 1975.
- Place
- Albuquerque, New Mexico, USA.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 7266760
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANODES; DEUTERONS; ELECTRON BEAMS; ION SOURCES; MAGNETIC MIRRORS; SPECIFICATIONS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; ELECTRODES; LEPTON BEAMS; OPEN PLASMA DEVICES; PARTICLE BEAMS; THERMONUCLEAR DEVICES
Optional Information
- Notes
- Available from NTIS. $3.50.
- Secondary number(s)
- CONF-751108--22.