Published November 12, 1975 | Version v1
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Intense, pulsed, ion-diode sources and their application to mirror machines

Description

Startup conditions for future mirror fusion experiments require a rapidly formed target plasma of approximately 0.5 coulomb of ions with energy of 50 to 100 keV. Theory suggests that very intense ion-flux emission satisfying these requirements can be extracted from a pulsed ion diode. Developing such sources would be an ideal CTR application of the high-power, single-shot capability of pulsed power technology. Recent experimental results are reviewed in which approximately 2 kA/cm2 of D+ at approximately 50 keV was extracted. In the experiment, an intense relativistic electron beam undergoes many transits through a solid but range-thin anode foil. With each transit the electrons lose energy, causing their trajectories to collapse toward the anode surface. In so doing, the increased space charge extracts an intense ion flux from the anode foil's plasma. Observations are reported on the importance of diode stability. The general agreement between theoretical scaling laws and experimental results are also presented

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS.

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Additional details

Publishing Information

Imprint Pagination
23 p.
Report number
UCRL--77156

Conference

Title
1. international topical conference on electron beam research and technology.
Dates
3 Nov 1975.
Place
Albuquerque, New Mexico, USA.

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7266760
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANODES; DEUTERONS; ELECTRON BEAMS; ION SOURCES; MAGNETIC MIRRORS; SPECIFICATIONS
Descriptors DEC
BEAMS; CHARGED PARTICLES; ELECTRODES; LEPTON BEAMS; OPEN PLASMA DEVICES; PARTICLE BEAMS; THERMONUCLEAR DEVICES

Optional Information

Notes
Available from NTIS. $3.50.
Secondary number(s)
CONF-751108--22.