Published February 2010 | Version v1
Journal article

A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate

  • 1. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35 μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz. Under VDS = 30 V, CW operating conditions at 14 GHz, the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a power added efficiency of 41%. Under pulse operating conditions, the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W. The power density reaches 3.4 W/mm. (semiconductor devices)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/31/2/024001

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
31
Journal Issue
2
Journal Page Range
[2 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42071439
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ALUMINIUM NITRIDES; ELECTRON MOBILITY; GALLIUM NITRIDES; SAPPHIRE; SUBSTRATES; TRANSISTORS
Descriptors DEC
ALUMINIUM COMPOUNDS; CORUNDUM; GALLIUM COMPOUNDS; MINERALS; MOBILITY; NITRIDES; NITROGEN COMPOUNDS; OXIDE MINERALS; PARTICLE MOBILITY; PNICTIDES; SEMICONDUCTOR DEVICES