Published January 1, 2010 | Version v1
Journal article Metadata-only

Self-assembly growth and structure study of BiFeO3-CoFe2O4 nanostructure film

Creators

  • 1. Centre for Superconducting and Magnetic Materials, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore)
  • 2. Temasek Laboratories, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260 (Singapore)

Description

Pulsed laser deposition method was used to prepare (0.67) BiFeO3- (0.33) CoFe2O4 nanostructure thin film. The XRD analysis shows that lower growth temperature will not obtain separation of BiFeO3 and CoFe2O4 phase. Post-annealing treatment will induce the phase separation. XRD data and SEM image both confirm these phase separation.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/200/7/072092

Additional details

Identifiers

DOI
10.1088/1742-6596/200/7/072092;

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
200
Journal Issue
7
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
international conference on magnetism
Acronym
ICM 2009
Dates
26-31 Jul 2009
Place
Karlsruhe (Germany)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42041766
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; BISMUTH COMPOUNDS; COBALT COMPOUNDS; COBALT OXIDES; CRYSTAL GROWTH; ENERGY BEAM DEPOSITION; FERRITES; LASER RADIATION; NANOSTRUCTURES; PULSED IRRADIATION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; COBALT COMPOUNDS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; FERRIMAGNETIC MATERIALS; FILMS; HEAT TREATMENTS; IRON COMPOUNDS; IRRADIATION; MAGNETIC MATERIALS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SCATTERING; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS