Published 1980
| Version v1
Miscellaneous
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Application of Auger electron spectroscopy in studies about diffusion of Cu in thin Ni films
Creators
- 1. Rio de Janeiro Univ. (Brazil). Coordenacao dos Programas de Pos-graduacao de Engenharia
Description
The diffusion coefficient of Cu in thin Ni films (350A) at low temperatures is determined by using Auger electron spectroscopy and timepermeation technic. A grain-boundary mechanism is proposed for the diffusion of Cu in Ni. The activation energy is determined to Q=0,6eV. (Author)
Availability note (English)
MF available from INIS under the Report Number.Abstract (Portuguese)
Utilizando a sensibilidade da espectroscopia de eletrons Auger e a tecnica de permeacao foi determinado o coeficiente de difusao do cobre em um filme fino de Ni (350A) a baixas temperaturas. Um mecanismo de difusao pelo contorno de grao e proposto, sendo a energia de ativacao Q=0,6 eV. (Autor)Files
14778127.pdf
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Additional details
Additional titles
- Original title (Portuguese)
- Aplicacao da espectroscopia de eletrons Auger no estudo da difusao em filmes finos de Cu/Ni
Publishing Information
- Imprint Pagination
- 6 p.
- Report number
- INIS-BR--77
Conference
- Title
- 4. Brazilian Congress on Materials Science and Engineering.
- Dates
- 15-17 Dec 1980.
- Place
- Camboriu, SC (Brazil).
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 14778127
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COPPER; DIFFUSION; ELECTRON SPECTROSCOPY; FILMS; GRAIN BOUNDARIES; IRON
- Descriptors DEC
- CRYSTAL STRUCTURE; ELEMENTS; METALS; MICROSTRUCTURE; SPECTROSCOPY; TRANSITION ELEMENTS