Photoelectron spectra of polysilanes
Description
Some organopolysilanes (high-molecular-weight polymers which only contain silicon atoms in their backbone) can be used as highly sensitive, self-developing uv photoresists. To understand the electronic structure of polysilanes and help rationalize their solid-state uv photosensitivity, we have recorded the photoelectron spectra of several polysilanes: poly(β-naphthylmethylsilane), poly(phenylmethylsilane, poly(n-dodecylmethylsilane, and poly(n-propylmethylsilane). We find that if the polymer photoemission spectra can be described in terms of backbone Si-Si and side-chain Si-C levels which do not hybridize (as in the alkyl polysilanes), then the solid-state uv sensitivity of the polymer is high. An explanation of this correlation in terms of the degree of hybridization of the low-lying bonding and antibonding Si-Si levels with the levels of the carbon side-group molecule will be presented
Additional details
Publishing Information
- Journal Title
- Phys. Rev., B: Condens. Matter
- Journal Volume
- 33
- Journal Issue
- 6
- Series
- Phys. Rev., B: Condens. Matter.
- Journal Page Range
- 4203-4206
- ISSN
- 0163-1829
- CODEN
- PRBMD
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17050111
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL BONDS; ELECTRONIC STRUCTURE; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTORS; PHOTOSENSITIVITY; POLYMERS; SILANES; ULTRAVIOLET RADIATION
- Descriptors DEC
- ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; EQUIPMENT; HYDRIDES; HYDROGEN COMPOUNDS; RADIATIONS; RESISTORS; SENSITIVITY; SILICON COMPOUNDS; SPECTROSCOPY