Published January 2006
| Version v1
Journal article
Plasma implantation using high-energy ions and short high voltage pulses
Creators
- 1. National Space Research Institute, Associated Plasma Laboratory, P.O. Box 515, 12245-970 Sao Jose dos Campos, SP (Brazil)
Description
The main objective of this paper is to describe the use of a high voltage pulser based on Blumlein technology for surface treatment by plasma immersion implantation. In particular, we will consider its potential application for nitriding polymer and Al surfaces. The Blumlein technique consists basically of charging several coaxial transmission in parallel and discharging them in series into a matched load by means of the closure of a thyratron switch at the generator input side
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2005.08.055;
- PII
- S0168-583X(05)01538-7;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 242
- Journal Issue
- 1-2
- Journal Page Range
- p. 328-331
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 14. international conference on ion beam modification of materials
- Dates
- 5-10 Sep 2004
- Place
- Pacific Grove, CA (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37068450
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRIC POTENTIAL; HIGH-VOLTAGE PULSE GENERATORS; ION IMPLANTATION; IONS; PLASMA; POLYMERS; POTENTIALS; PULSES; SURFACES; SWITCHES
- Descriptors DEC
- CHARGED PARTICLES; ELECTRICAL EQUIPMENT; ELECTRONIC EQUIPMENT; EQUIPMENT; FUNCTION GENERATORS; PULSE GENERATORS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.