Published August 16, 1987 | Version v1
Journal article

Defect characteristics in different crystallographic directions in Cz-Si as a function of doping and annealing

  • 1. Technische Univ., Graz (Austria). Inst. fuer Kernphysik
  • 2. Winnipeg Univ., Manitoba (Canada). Dept. of Physics

Description

Measurements of the S-parameter as well as of lifetimes are performed as a function of thermal annealing in the 20 to 1100 0C range. Cz-Si with different levels of boron doping is investigated. A significant broadening of the annihilation line is found around 800 0C for the heavily doped sample. Concurrent with this a short-lived (∼ 100 ps) lifetime component is observed with an intensity up to 30%. No obvious changes in the anisotropy of the annihilation line take place. (author)

Part of:
Proceedings of the European Meeting on Positron Studies of Defects

Additional details

Publishing Information

Journal Title
Phys. Status Solidi A
Journal Volume
102
Journal Issue
2
Series
Phys. Status Solidi A.
Journal Page Range
527-531
ISSN
0031-8965
CODEN
PSSAB

Conference

Title
European meeting on positron studies of defects.
Dates
23-27 Mar 1987.
Place
Wernigerode (German Democratic Republic).

Optional Information