Shape transformation of Si1−xGex structures on ultra clean Si(5 5 7) and Si(5 5 12) surfaces

We report growth of Ge nano/micro structures on ultra clean, high vicinal silicon surfaces of Si(5 5 7) and Si(5 5 12) under two substrate heating conditions: direct current (DC) and radiative heating (RH). These were grown under ultra high vacuum conditions while keeping the substrate at a temperature of 600°C. The results for 10 monolayer (ML) and 12 ML thick Ge deposited on the above surfaces show spherical island structures for RH conditions while aligned trapezoidal structures were observed under DC conditions of heating. We find that the longer side of trapezoid structures are along <11-bar 0> irrespective of DC current direction. In the case of 10 ML Ge deposited on Si (5 5 7), elongated SixGe1−x nanostructures with an average length of ≈300 nm and a length/width ratio of ≈3.3 have been formed along the step edges. Under similar conditions for 10 ML Ge growth on Si(5 5 12), we found aligned SixGe1−x trapezoidal microstructures of length ≈6.25 μm and an aspect ratio of ≈3.0. Scanning transmission electron microscopy (STEM) measurements showed the mixing of Ge and Si at the interface and throughout the over-layer. Detailed electron microscopy studies (scanning electron microscopy (SEM) and STEM) reveal the structural aspects of these microstructures.