Published March 2006 | Version v1
Journal article

Formation of carbon nitride compounds during successive implantations in copper

  • 1. Laboratoire d'Analyses par Reactions Nucleaires, Facultes Universitaires Notre-Dame de la Paix, 61 rue de Bruxelles, B-5000 Namur (Belgium)
  • 2. Laboratoire Interdisciplinaire de Spectroscopie Electronique, Facultes Universitaires Notre-Dame de la Paix, 61 rue de Bruxelles, B-5000 Namur (Belgium)

Description

Copper substrates are successively implanted with carbon and nitrogen (13C+ and 14N+) at high fluences (5 x 1017 and 1 x 1017 at. cm-2, respectively) in order to synthesize specific carbon nitride compounds. The concentration as well as the depth distribution of carbon 13C and nitrogen 14N are determined using non resonant nuclear reactions induced by a 1.05 MeV deuteron beam. The use of (d,p) and (d,α) reactions allows us to profile both 13C and 14N elements with a single and relatively rapid measurement and a quite good resolution. The bonded states of carbon and nitrogen are studied as a function of depth by X-ray photoelectron spectroscopy (XPS). The curve fitting of the C 1s and N 1s photopeaks shows that carbon and nitrogen atoms exist in different chemical states depending on the analysis depth, which correspond to specific kinds of chemical bonds. At least two characteristic C-N bonds are detected indicating that different carbon nitride compounds have been formed during the implantations

Additional details

Identifiers

DOI
10.1016/j.elspec.2005.10.001;
PII
S0368-2048(05)00481-0;

Publishing Information

Journal Title
Journal of Electron Spectroscopy and Related Phenomena
Journal Volume
151
Journal Issue
1
Journal Page Range
p. 19-23
ISSN
0368-2048
CODEN
JESRAW

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.