Disorder–order phase transformation in a fluorite-related oxide thin film: In-situ X-ray diffraction and modelling of the residual stress effects
Creators
- 1. Institut Pprime, Department of Material Sciences, CNRS-University of Poitiers SP2MI-BP 30179, 86962 Futuroscope-Chasseneuil cedex (France)
- 2. CSIC, Institut de Ciencia de Materiales, University of Sevilla, Avenida Américo Vespucio, 49, 41092 Sevilla (Spain)
Description
This work is focused on the transformation of the disordered fluorite cubic-F phase to the ordered cubic-C bixbyite phase, induced by isothermal annealing as a function of the residual stresses resulting from different concentrations of microstructural defects in the yttrium oxide, Y2O3. This transformation was studied using in-situ X-ray diffraction and was modelled using Kolmogorov–Johnson–Mehl–Avrami (KJMA) analysis. The degree of the disorder of the oxygen network was associated with the residual stress, which was a key parameter for the stability and the kinetics of the transition of the different phases that were present in the thin oxide film. When the degree of disorder/residual stress level is high, this transition, which occurs at a rather low temperature (300 °C), is interpreted as a transformation of phases that occurs by a complete recrystallization via the nucleation and growth of a new cubic-C structure. Using the KJMA model, we determined the activation energy of the transformation process, which indicates that this transition occurs via a one-dimensional diffusion process. Thus, we present the analysis and modelling of the stress state. When the disorder/residual stress level was low, a transition to the quasi-perfect ordered cubic-C structure of the yttrium oxide appeared at a rather high temperature (800 °C), which is interpreted as a classic recovery mechanism of the cubic-C structure. - Highlights: • Rare earth oxide thin films • XRD analysis • Phase transformation modelling • Residual stress effects • Crystallographic phase stability
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2015.08.030Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2015.08.030;
- PII
- S0040-6090(15)00794-4;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 601
- Journal Page Range
- p. 84-88
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Synthesis, processing and characterization of nanoscale multi-functional oxide films
- Acronym
- E-MRS spring meeting 2015 symposium N
- Dates
- 11-15 May 2015
- Place
- Lille (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48020818
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACTIVATION ENERGY; ANNEALING; CONCENTRATION RATIO; CUBIC LATTICES; DIFFUSION; MICROSTRUCTURE; NUCLEATION; PHASE STABILITY; PHASE TRANSFORMATIONS; RARE EARTHS; RECRYSTALLIZATION; RESIDUAL STRESSES; TEMPERATURE DEPENDENCE; THIN FILMS; X-RAY DIFFRACTION; YTTRIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIFFRACTION; DIMENSIONLESS NUMBERS; ELEMENTS; ENERGY; FILMS; HEAT TREATMENTS; METALS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; STABILITY; STRESSES; THREE-DIMENSIONAL LATTICES; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.