Published February 2013 | Version v1
Journal article

Evaluation of fracture toughness of copper thin films by combining numerical analyses and experimental tests

  • 1. Seoul National Universtiy of Science and Technology, Seoul (Korea, Republic of)
  • 2. Ulsan College, Ulsan (Korea, Republic of)
  • 3. Korea Institute of Materials Science, Changwon (Korea, Republic of)
  • 4. Korea Institute of Machinery and Materials, Daejeon (Korea, Republic of)

Description

In this paper, a method of combining numerical analyses and experimental tests is used to evaluate fracture toughness of copper thin films of 15μm thickness. Far field loadings of a global local finite element model are inversely estimated by matching crack opening profiles in experiments with numerical results. The fracture toughness is then evaluated using the J integral for cracks in thin films under far field loadings. In experiments, Cu thin films attached to Aluminum sheets are loaded indirectly, and crack opening profiles are observed by microscope camera. Stress versus strain curves of Cu thin films are obtained through micro tensile tests, and the grain size of Cu thin films is observed by TEM analysis. The results show that the fracture toughness of Cu thin films with 500nm∼1μm sized grains is 6,962J/m'2'

Additional details

Publishing Information

Journal Title
Transactions of the Korean Society of Mechanical Engineers. A
Journal Volume
37
Journal Issue
2
Series
15 refs, 11 figs, 2 tabs
Journal Page Range
p. 233-239
ISSN
1226-4873

INIS

Country of Publication
Korea, Republic of
Country of Input or Organization
Korea, Republic of
INIS RN
44064541
Subject category
S42: ENGINEERING;
Descriptors DEI
ALUMINIUM; CAMERAS; COPPER; CRACKS; FINITE ELEMENT METHOD; FRACTURE PROPERTIES; NUMERICAL ANALYSIS; TENSILE PROPERTIES; THICKNESS; THIN FILMS
Descriptors DEC
CALCULATION METHODS; DIMENSIONS; ELEMENTS; FILMS; MATHEMATICAL SOLUTIONS; MATHEMATICS; MECHANICAL PROPERTIES; METALS; NUMERICAL SOLUTION; TRANSITION ELEMENTS