Published June 1998 | Version v1
Journal article

Physical characterization of electron trapping in Unibond reg-sign oxides

  • 1. SOITEC S.A., Grenoble (France)
  • 2. CEA Centre d'Etudes, Bruyeres-le-Chatel (France)
  • 3. LETI DMITEC-CENG, Grenoble (France)

Description

In this work, the authors study the trapping properties of Unibond reg-sign oxides. They measure its radiative response under different irradiation conditions using both point-contact and MOS transistors. The results obtained show both hole and electron trapping, as previously observed in SIMOX. But in the Unibond case, there is a positive shift of the threshold voltage at very high doses. Using a simple model, they explain this shift by considering a second type of electron traps

Additional details

Publishing Information

Journal Title
IEEE Transactions on Nuclear Science
Journal Volume
45
Journal Issue
3Pt3
Journal Page Range
p. 1402-1406
ISSN
0018-9499
CODEN
IETNAE

Conference

Title
radiations and their effects on devices and systems conference
Acronym
RADECS 97
Dates
15-19 Sep 1997
Place
Cannes (France)

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
29060913
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
MATHEMATICAL MODELS; MOS TRANSISTORS; PHYSICAL RADIATION EFFECTS; SILICON OXIDES; TRAPPING; X RADIATION
Descriptors DEC
CHALCOGENIDES; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; TRANSISTORS

Optional Information

Secondary number(s)
CONF-970934--