Published June 1998
| Version v1
Journal article
Physical characterization of electron trapping in Unibond reg-sign oxides
- 1. SOITEC S.A., Grenoble (France)
- 2. CEA Centre d'Etudes, Bruyeres-le-Chatel (France)
- 3. LETI DMITEC-CENG, Grenoble (France)
Description
In this work, the authors study the trapping properties of Unibond reg-sign oxides. They measure its radiative response under different irradiation conditions using both point-contact and MOS transistors. The results obtained show both hole and electron trapping, as previously observed in SIMOX. But in the Unibond case, there is a positive shift of the threshold voltage at very high doses. Using a simple model, they explain this shift by considering a second type of electron traps
Additional details
Publishing Information
- Journal Title
- IEEE Transactions on Nuclear Science
- Journal Volume
- 45
- Journal Issue
- 3Pt3
- Journal Page Range
- p. 1402-1406
- ISSN
- 0018-9499
- CODEN
- IETNAE
Conference
- Title
- radiations and their effects on devices and systems conference
- Acronym
- RADECS 97
- Dates
- 15-19 Sep 1997
- Place
- Cannes (France)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 29060913
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- MATHEMATICAL MODELS; MOS TRANSISTORS; PHYSICAL RADIATION EFFECTS; SILICON OXIDES; TRAPPING; X RADIATION
- Descriptors DEC
- CHALCOGENIDES; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; TRANSISTORS
Optional Information
- Secondary number(s)
- CONF-970934--