Published June 11, 2003 | Version v1
Journal article Metadata-only

Argon Ion Induced Changes On Cadmium Iodide Thin Films Using Dense Plasma Focus Device

Creators

  • 1. Natural Sciences, National Institute of Education, Nanyang Technological University (Singapore)
  • 2. International Centre for Dense Magnetised Plasmas, Warsaw (Poland)
  • 3. Depatment of Physics, University of Delhi, Delhi (India)

Description

The pulsed beam of energetic argon ions that is generated in dense plasma focus device is used to irradiate the as-grown cadmium iodide films. The film samples were exposed to energetic argon ions at the different distances from the top of the central electrode. The exposed samples were then analyzed for their structure, surface morphology, optical property and elemental composition using X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible spectroscopy and energy dispersive X-ray spectroscopy (EDX). The comparison of the unexposed and energetic ion exposed film samples is discussed in the present paper

Additional details

Identifiers

DOI
10.1063/1.1593935;

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
669
Journal Issue
1
Journal Page Range
p. 343-346
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
11. international congress on plasma physics
Acronym
ICPP 2002
Dates
15-19 Jul 2002
Place
Sydney (Australia)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36068283
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARGON IONS; CADMIUM IODIDES; COMPARATIVE EVALUATIONS; DEPOSITION; DISTANCE; ELECTRODES; ION BEAMS; MORPHOLOGY; OPTICAL PROPERTIES; PLASMA FOCUS; PLASMA FOCUS DEVICES; SCANNING ELECTRON MICROSCOPY; SURFACES; TAIL IONS; THIN FILMS; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
Descriptors DEC
BEAMS; CADMIUM COMPOUNDS; CADMIUM HALIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; EVALUATION; FILMS; HALIDES; HALOGEN COMPOUNDS; IODIDES; IODINE COMPOUNDS; IONS; MICROSCOPY; OPEN PLASMA DEVICES; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; THERMONUCLEAR DEVICES

Optional Information

Notes
(c) 2003 American Institute of Physics