Published November 30, 2008 | Version v1
Journal article

Electronic, vibrational and related properties of group IV metal oxides by ab initio calculations

  • 1. Departamento de Ciencias Naturais, Universidade Federal de Sao Joao del Rei, C.P. 110, Sao Joao del Rei, MG 36301-160 (Brazil)
  • 2. Departamento de Fisica, Universidade Federal de Uberlandia, C.P. 593, Uberlandia, MG 38400-902 (Brazil)
  • 3. Departamento de Engenharia de Telecomunicacoes, Uniao Educacional de Minas Gerais, Uberlandia, MG 38411-113 (Brazil)
  • 4. Instituto de Fisica, Universidade de Sao Paulo, C.P. 66318, Sao Paulo, SP 05315-970 (Brazil)
  • 5. Departamento de Fisica, Universidade Federal de Pernambuco, Cidade Universitaria, Recife, PE 50670-901 (Brazil)

Description

We present our theoretical results for the structural, electronic, vibrational and optical properties of MO2 (M = Sn, Zr, Hf and Ti) obtained by first-principles calculations. Relativistic effects are demonstrated to be important for a realistic description of the detailed structure of the electronic frequency-dependent dielectric function, as well as of the carrier effective masses. Based on our results, we found that the main contribution of the high values calculated for the oxides dielectric constants arises from the vibrational properties of these oxides, and the vibrational static dielectric constant values diminish with increasing pressure

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.07.031

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.07.031;
PII
S0169-4332(08)01615-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
3
Journal Page Range
p. 752-754
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
11. international conference on the formation of semiconductor interfaces
Acronym
ICFSI-11
Dates
19-24 Aug 2007
Place
Manaus (Brazil)

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.