Published September 1980 | Version v1
Journal article

Far infrared emission from plasma oscillations of Si inversion layers

  • 1. Bell Labs., Murray Hill, NJ (USA)

Description

Narrow-band far infrared emission from Si-MOSFETs was observed with metallic gratings fabricated on the optically semitransparent gate. The gate voltage dependence of the emission frequency, analyzed by a magnetic field tuned detector, shows that it results from radiative decay of the two-dimensional plasmons of the inversion layer, through coupling with the metallic grating. (author)

Additional details

Publishing Information

Journal Title
Solid State Commun.
Journal Volume
35
Journal Issue
11
Series
Solid State Commun.
Journal Page Range
875-877
ISSN
0038-1098