External ion injection into an electron beam ion source

In this paper we discuss the design, construction and results obtained with an external ion injection system into the Cornell superconducting solenoid, cryogenic electron beam ion source CEBIS II. A small sputter-PIG ion source with cathodes made from the material to be ionized is used as a source of dc currents of singly charged ions which are transported and injected into the ionization region of the EBIS. The injection system uses a 90deg electrostatic quadrupole deflector which directs the beam from the sputter-PIG into the electron beam ion source during injection, and acts as an einzel lens during ion extraction from CEBIS II. (orig.)