Experimental study on vertical scaling of InAs-on-insulator metal-oxide-semiconductor field-effect transistors

We have investigated effects of the vertical scaling on electrical properties in extremely thin-body InAs-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs). It is found that the body thickness (Tbody) scaling provides better short channel effect (SCE) control, whereas the Tbody scaling also causes the reduction of the mobility limited by channel thickness fluctuation (δTbody) scattering (μfluctuation). Also, in order to achieve better SCEs control, the thickness of InAs channel layer (Tchannel) scaling is more favorable than the thickness of MOS interface buffer layer (Tbuffer) scaling from a viewpoint of a balance between SCEs control and μfluctuation reduction. These results indicate necessity of quantum well channel structure in InAs-OI MOSFETs and these should be considered in future transistor design.