Published March 2016 | Version v1
Journal article

Design and fabrication of 1.55 μm broad area slotted single-mode Fabry–Perot lasers

  • 1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

We present a single-mode laser on a p-InP substrate suitable for bonding on silicon-on-insulator (SOI) wafer. The laser can realize single mode lasing with etching perturbing slots by standard photolithography and an inductively coupled-plasma (ICP) etching technique without any regrowth steps. The parameters were designed using the simulation tool "cavity modeling framework" (CAMFR). The single mode of 1539 nm wavelength at the threshold current of 130 mA with the maximum output power of 3.9 mW was obtained at 10 °C in continuous-wave operation. The simple technology, low cost and the single-mode characteristics make the broad area slotted single-mode FP laser a promising light source on the silicon-based optical interconnection applications. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/37/3/034007

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
37
Journal Issue
3
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47089206
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BONDING; DESIGN; INDIUM PHOSPHIDES; LASERS; SILICON; SIMULATION; SUBSTRATES; WAVELENGTHS
Descriptors DEC
ELEMENTS; FABRICATION; INDIUM COMPOUNDS; JOINING; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; SEMIMETALS