Published January 1982
| Version v1
Journal article
Gold diffusion into silicon under low energy ion bombardment
- 1. AN SSSR, Leningrad. Fiziko-Tekhnicheskij Inst.
Description
no abstract available
Additional details
Additional titles
- Original title (Russian)
- Диффузия золота в кремний в условиях низкоэнергетической ионной бомбардировки
Publishing Information
- Journal Title
- Zh. Tekh. Fiz.
- Journal Volume
- 52
- Journal Issue
- 1
- Series
- Zh. Tekh. Fiz.
- Journal Page Range
- 167-169
- ISSN
- 0044-4642
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 14798874
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- ARGON IONS; DIFFUSION; EV RANGE 100-1000; FILMS; GOLD; ION BEAMS; MONOCRYSTALS; PHYSICAL RADIATION EFFECTS; RADIOMETRIC ANALYSIS; SILICON
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CHEMICAL ANALYSIS; CRYSTALS; ELEMENTS; ENERGY RANGE; EV RANGE; IONS; METALS; QUANTITATIVE CHEMICAL ANALYSIS; RADIATION EFFECTS; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Notes
- Short note. For English translation see the journal Soviet Physics - Technical Physics (USA).