Published August 28, 1998 | Version v1
Journal article

Medical applications of amorphous silicon detectors

  • 1. Seccion de Electronica del Estado Solido, Depto. de Ingenieria Electrica, CINVESTAV-IPN, A.P. 14 740, Mexico D.F. (Mexico)
  • 2. Centro de Estudio Aplicados al Desarrollo Nuclear, P.O. Box 6122, La Habana (Cuba)

Description

During the last years, much interest has been dedicated to the use of PIN silicon amorphous diodes as particle and radiation detectors for medical applications. This work presents a review of the work done in the last years, including results obtained by the authors, regarding the characterization of amorphous PIN diodes fabricated on thick i-layers, deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition), with a deposition rate of 2.5 μm/hr from pure SiH4 at 200 deg. C, 20 sccm, 43 Pa, RF (Radio Frequency) power of 50 mW/cm2 and from a gas mixture of 10%SiH4 in H2 with deposition rates up to 0.9 μm/hr at a deposition temperature of 300 deg. C, 67 Pa, RF power of 150 mW/cm2 and flow rates of 100 sccm

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
440
Journal Issue
1
Journal Page Range
p. 179-186
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
2. Mexican symposium on medical physics
Dates
26-28 Feb 1998
Place
Coyoacan (Mexico)

Optional Information

Notes
(c) 1998 American Institute of Physics.