A repetitively pulsed HF laser with a large discharge gap operating on the F2-H2 mixture
Creators
- 1. Russian Science Centre 'Applied Chemistry', St Petersburg (Russian Federation)
- 2. Laboratoire de Physique des Gaz et des Plasmas, Universite Paris-Sud, Orsay (France)
Description
An efficient repetitively pulsed (RP) HF laser pumped by a barrier electric discharge with a 10-cm discharge gap is developed. A specific output energy E/V=3 and 23 J L-1 and a technical efficiency η equal to 3.4% and 26%, respectively, were obtained in the single-pulse regime for non-chain and chain processes. An average output power of 43 W (E/V∼10 J L-1 and η=11.3%) was obtained in the RP mode of the laser with a pulse repetition rate of 10 Hz for a depleted fluorine-hydrogen mixture (20% F2, 5% H2). Numerical simulation of laser operation under the conditions corresponding to the RP regime for an active medium length of about 0.5 m showed that a specific output energy of 15 J L-1 and a technical efficiency right up to 20% can be attained in a single pulse. A specific output energy ∼14 J L-1 attained under such conditions in the single-pulse mode for an active medium length of 0.37 m is found to be in good agreement with the theoretical values. (lasers)
Availability note (English)
Available from http://dx.doi.org/10.1070/QE2005v035n09ABEH010350Additional details
Identifiers
Publishing Information
- Journal Title
- Quantum Electronics (Woodbury, N.Y.)
- Journal Volume
- 35
- Journal Issue
- 9
- Journal Page Range
- p. 805-808
- ISSN
- 1063-7818
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42051983
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL LASERS; COMPUTERIZED SIMULATION; EFFICIENCY; ELECTRIC DISCHARGES; FLUORINE; HYDROFLUORIC ACID; HYDROGEN; PULSES
- Descriptors DEC
- ELEMENTS; FLUORINE COMPOUNDS; HALOGEN COMPOUNDS; HALOGENS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; LASERS; NONMETALS; SIMULATION