Published April 22, 2005 | Version v1
Journal article

Kinetics of nitrogen dioxide exposure in lead phthalocyanine sensors

  • 1. National Metal and Materials Technology Center, 114 Paholyothin Rd., Km 42, Klong 1, Klong Luang, Pathumthani 12120 Thailand (Thailand)
  • 2. National Metal and Materials Technology Center, 114 Paholyothin Rd., Km 42, Klong 1, Klong Luang, Pathumthani 12120 Thailand (TH)

Description

Lead phthalocyanine (PbPc) films containing 93.0 wt.% PbPc were deposited by spin coating technique using polypyrrole (PPy) as a binder. The film response toward nitrogen dioxide (NO2) was found to be a first-order reaction. The rate-determining step was the charge transfer between the adsorbed NO2 and the film surface. The activation energy for the first cycle of exposure (14.3 kJ mol-1) was found to be higher than that for the second cycle (13.0 kJ mol-1), corresponding to the higher rate constant for the second cycle. The NO2 response of the film was found to obey the Elovich equation and thus NO2 concentration can be derived from rate of reaction

Additional details

Identifiers

DOI
10.1016/j.tsf.2004.08.125;
PII
S0040-6090(04)01281-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
477
Journal Issue
1-2
Journal Page Range
p. 148-152
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
2. international conference on materials for advanced technologies
Acronym
ICMAT 03
Dates
7-12 Dec 2003
Place
Singapore (Singapore)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37017112
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACTIVATION ENERGY; LEAD COMPLEXES; NITROGEN DIOXIDE; PHTHALOCYANINES; REACTION KINETICS; SURFACES; THIN FILMS
Descriptors DEC
CHALCOGENIDES; COMPLEXES; DYES; ENERGY; FILMS; HETEROCYCLIC COMPOUNDS; KINETICS; NITROGEN COMPOUNDS; NITROGEN OXIDES; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.