Flexible megavolt system for ion implantation and ion beam analysis

Megavolt ion beams have proven to be of interest for ion beam analysis as well as for ion implantation. Recently High Voltage Engineering Europa B.V. developed highly flexible megavolt systems suitable for both techniques. The heart of the system is a single-ended accelerator equipped with a unique ion source exchange system capable of handling four kinds of ion sources, mass separation at high voltage level and an X-ray intensity suppression system. The accelerator is able to produce a large variety of continuous homogeneous and highly collimated mass-analyzed ions beams of from several to a hundred μA in the energy range of 50 keV upto 1 MeV (1 MV model) or 100 keV up to 2 MeV (2 MV model) using singly charged ions, whereby the maximum energy can be easily reached and maintained without conditioning. Combined with two dedicated end stations (one for ion beam analysis using RBS, channeling, NRA and PIXE and one with automatic wafer handling system for both single wafer implantation and batch processing) this system is suitable for research as well as industrial applications. (orig.)