Published January 7, 2011
| Version v1
Journal article
Synthesis of Endohedral Fullerene Using ECR Ion Source
Creators
- 1. Graduate School of Engineering, Toyo University, 2100 Kujirai, Kawagoe, Saitama (Japan)
- 2. Bio-Nano Electronics Research Centre, Toyo University, 2100 Kujirai, Kawagoe, Saitama (Japan)
- 3. Tateyama Machine Co., Ltd., 30 Shimonoban, Toyama, Toyama (Japan)
- 4. National Institute of Radiological Sciences (NIRS), 4-9-1 Anagawa, Inage, Chiba (Japan)
- 5. Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka (Japan)
- 6. Institute of Nuclear Research (ATOMKI), H-4026 Debrecen (Hungary)
Description
We are developing an ECRIS apparatus which is designed for the production of endohedral fullerenes. Our promising approaches to produce the endohedral fullerenes using the ECRIS are the ion-ion collision reaction of fullerenes and the other atom in their mixture plasma and simple ion implantation of atom into fullerene layer. In this study, we tried to synthesize the endohedral nitrogen-fullerenes by ion implantation. N+ beam was irradiated to a fullerene target with a specific energy and dose. As a result, we could observe the peak of N+C60 from targets after N+ beam irradiation with TOF-SIMS and LDI-TOF-MS.
Additional details
Identifiers
- DOI
- 10.1063/1.3548456;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1321
- Journal Issue
- 1
- Journal Page Range
- p. 480-483
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 18. international conference on ion implantation technology
- Acronym
- IIT 2010
- Dates
- 6-11 Jun 2010
- Place
- Kyoto (Japan)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42103188
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMS; BEAMS; CYCLOTRON RESONANCE; DOSES; ECR ION SOURCES; EQUIPMENT; FULLERENES; ION IMPLANTATION; ION MICROPROBE ANALYSIS; ION-ION COLLISIONS; IRRADIATION; LAYERS; MASS SPECTROSCOPY; MIXTURES; NITROGEN; NITROGEN IONS; PEAKS; PLASMA; SYNTHESIS
- Descriptors DEC
- CARBON; CHARGED PARTICLES; CHEMICAL ANALYSIS; COLLISIONS; DISPERSIONS; ELEMENTS; ION COLLISIONS; ION SOURCES; IONS; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; NONMETALS; RESONANCE; SPECTROSCOPY
Optional Information
- Notes
- (c) 2010 American Institute of Physics