Published October 2008 | Version v1
Journal article

Microstructure of 5 keV gold-implanted polydimethylsiloxane

  • 1. Ecole Polytechnique Federale de Lausanne (EPFL), Microsystems for Space Technologies Laboratory (LMTS), Rue Jaquet-Droz 1, Case Postale 526, CH-2002 Neuchatel (Switzerland)
  • 2. Institute of Microtechnology, University of Neuchatel, Neuchatel (Switzerland)

Description

The first high-resolution transmission electron microscopy (TEM) cross-section images of flexible electrodes fabricated by gold ion implantation at 5 keV into polydimethylsiloxane (PDMS) are presented. A TEM sample preparation method based on cryoultramicrotomy, adapted for extremely low-modulus (1 MPa) elastomers, was developed, allowing the gold nanoparticles in a PDMS matrix to be imaged. The cluster size, size distribution and implantation depth of 50 nm were determined from the images and used to calculate the Young's modulus of the implanted layer

Availability note (English)

Available from http://dx.doi.org/10.1016/j.scriptamat.2008.06.038

Additional details

Identifiers

DOI
10.1016/j.scriptamat.2008.06.038;
PII
S1359-6462(08)00486-7;

Publishing Information

Journal Title
Scripta Materialia
Journal Volume
59
Journal Issue
8
Journal Page Range
p. 893-896
ISSN
1359-6462
CODEN
SCMAF7

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.