Published October 27, 2015
| Version v1
Journal article
Strain localization parameters of AlCu4MgSi processed by high-energy electron beams
- 1. National Research Tomsk Polytechnic University, Tomsk, 634050 (Russian Federation)
- 2. Institute of Strength Physics and Materials Science SB RAS, Tomsk, 634055 (Russian Federation)
- 3. Siberian State Industrial University, Novokuznetsk, 654007 (Russian Federation)
- 4. Institute of High Current Electronics SB RAS, Tomsk, 634055 (Russian Federation)
Description
The influence of the electron beam surface treatment of AlCu4MgSi on the strain localization parameters and on the critical strain value of the Portevin–Le Chatelier effect has been considered. The strain localization parameters were measured using speckle imaging of the specimens subjected to the constant strain rate uniaxial tension at a room temperature. Impact of the surface treatment on the Portevin–Le Chatelier effect has been investigated
Additional details
Identifiers
- DOI
- 10.1063/1.4932819;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1683
- Journal Issue
- 1
- Journal Page Range
- p. 020129-020129.4
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- International conference on advanced materials with hierarchical structure for new technologies and reliable structures 2015
- Dates
- 21-25 Sep 2015
- Place
- Tomsk (Russian Federation)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47062695
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM COMPOUNDS; BIOMEDICAL RADIOGRAPHY; COPPER COMPOUNDS; DEFORMATION; ELECTRON BEAMS; MAGNESIUM SILICIDES; STRAIN RATE; STRAINS; SURFACE TREATMENTS; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; BEAMS; DIAGNOSTIC TECHNIQUES; LEPTON BEAMS; MAGNESIUM COMPOUNDS; MEDICINE; NUCLEAR MEDICINE; PARTICLE BEAMS; RADIOLOGY; SILICIDES; SILICON COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2015 AIP Publishing LLC